用测定阴极极化曲线、比色分析、X射线、扫描电镜及电子探针分析等方法系统地研究了(Fe,Co,Ni)-P合金电化学沉积条件与镀层结构的关系。结果表明:电化学沉积条件对镀层结构的影响是通过镀层中磷含量变化实现的;镀液中NaH_2PO_2浓度及pH值是两种主要影响因素;找出了电位与结构关系以及各系非晶态结构小片堆垛最高高度。
A study has been made of the structure of the electrochemically deposited amorphous (Fe, Co, Ni)-P layers with relation to the process conditions, e.g. pH value, current density, metallic salt concentration, etc., by means of X-ray analysis, SEM and EPMA. Results showed that the effect of the process on the structure is realized by changing the P content of the layer. While P contained over 8%, below 3% or between 3 and 8%, a layer may be constructed as amorphous alloy, supersaturated solution or mixed structures respectively. The major factors affecting the structure of the deposited layer are found to be the concentration of NaH_2PO_2 and pH value of the bath. The structure of the layer may be also influenced by the potential of electro-deposition. The Fe-P, Co-P or Ni-P system is similar in amorphous structure of which the highest thickness of stack of the atomic face is 2.0, 2.5 or 6.5nm respectively.
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