采用调制偏压射频磁控溅射技术在多晶Hastelloy-C金属基带上制备钇稳定的ZrO2薄膜(YSZ), 得到了c-轴织构和部分平面内双轴织构的YSZ薄膜. 用X射线衍射θ-2θ扫描、ω扫描和φ扫描对YSZ薄膜的织构进行了测量, 并研究了沉积条件对织构形成的影响.
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