采用SEM,XRD等手段对钽在氢与氮等离子体中形成的表面层进行了分析.试验表明,在外界参数相同的情况下,H+N等离子体的存在改变了Ta表面在H-O-N气氛中的反应路径,使反应产物由无等离子体时的Ta2O5变成了Ta6N2.57,因此处理后的表面粗糙度比无等离子体时下降了一个数量级;对等离子体的作用机理进行了探讨.认为是等离子体的存在改变了介质成分和Ta表面附近形成的"阴极鞘层”与Ta表面相互作用抑制了粗糙的Ta2O5形成.
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