讲述原子层沉积技术原理与特点的同时,进一步论述了它在沉积机理和实验真空度这两方面与传统薄膜沉积工艺的异同;综述了此技术在铁电薄膜制备研究方面的最新进展,前驱体的制备与选择、薄膜缺陷的控制以及表面化学反应动力学依然是当前原子层制备铁电薄膜研究的重点;最后展望了原子层沉积技术制备铁电薄膜的发展方向.
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