采用非平衡磁控溅射技术在AISI202不锈钢片和P(111)单晶硅基底上制备了TiAlN薄膜,并利用场发射扫描电镜(FESEM)、三维轮廓仪、X射线衍射仪(XRD)、X射线电子能谱仪(XPS)、纳米压痕仪对薄膜的结构和性能进行了考查.结果表明,随着N2流量的升高,TiAlN薄膜的沉积速率降低,Al/Ti比率先升高后迅速降低；薄膜主要由TiN立方晶构成,且随N2流量的升高晶粒尺寸减小,柱状晶结构变疏松.在氮气流量为20mL/min时,薄膜具有最高的硬度及结合力.
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