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综述了稀磁半导体及其研究进展,阐述了提高居里温度的方法.从晶体结构、材料的研究现状和待解决的问题几个方面详述了以GaN为代表的传统的Ⅲ-Ⅴ族基和LiZnAs为代表的新型Ⅰ-Ⅱ-Ⅴ族基两类稀磁半导体的基本特点,并展望了今后的研究重点及发展方向.

参考文献

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