用脉冲直流等离子体增强化学气相沉积 (PCVD) 方法，在高速钢试样表面沉积出一种新型Ti-Si-C-N薄膜材料. 研究了不同SiCl4流量对薄膜成分、微观组织形貌以及薄膜晶体结构的影响. X射线衍射 (XRD)、X射线光电子能谱 (XPS)、透射电子显微镜 (TEM) 和扫描电子显微镜 (SEM) 分析结果表明: Ti-Si-C-N薄膜是由Ti(C, N)/a-C/a-Si3N4组成的纳米复合结构，薄膜的晶粒尺寸在225 nm范围内; 当Ti-Si-C-N薄膜中N含量很少时，Ti(C, N) 结构转变为TiC, 薄膜的表面形貌由颗粒状转变为粗条状.
Using an industrial pulsed DC plasma chemical vapor deposition set-up, Ti-Si-C-N coatings were deposited on substrate of high speed steel. The effect of SiCl4 flow rate on chemical composition, microstructure and phases in Ti-Si-C-N coatings was explored by means of XRD, XPS, TEM and SEM. It is suggested that Ti-Si-C-N coatings are of nanocomposite structure composed of nc-Ti(C, N)/a-C/a-Si3N4. The crystalline sizes are in the range of 2-25 nm. When nitrogen content in the coatings was very low, Ti(C, N) changed to TiC and the surface morphologies of Ti-Si-C-N coatings changed from granular grains to strip-shaped grains.
参考文献
| [1] | |
| [2] | |
| [3] | |
| [4] | |
| [5] | |
| [6] | |
| [7] | |
| [8] | |
| [9] | |
| [10] | |
| [11] | |
| [12] |
- 下载量()
- 访问量()
- 您的评分：
-
10%
-
20%
-
30%
-
40%
-
50%