欢迎登录材料期刊网

材料期刊网

高级检索

在室温条件下,利用自行设计的平面"S"形磁过滤等离子体设备,在(111)面单晶硅上制备TiN薄膜,通过改变基底偏压和反应气体成分,即通过改变氮气和氩气的气体流量来改变沉积离子的能量和密度,从离子轰击的角度研究了沉积条件对TiN薄膜织构的影响.对薄膜的表面形貌进行观察,用(θ~2θ)和1.5°掠入射2种X射线衍射方法对薄膜晶体结构和晶面取向进行了分析,对薄膜进行了电子衍射研究.结果显示磁过滤等离子制备的TiN薄膜表面平整光滑,颗粒尺寸为20~70 nm,且基底偏压和氩气流量的增大促使薄膜发生(111)面的择优取向,且(111)晶面与膜表面平行,而在高氩气流量的情况下,(200)和(220)面在薄膜平面也发生了定向排列.

参考文献

[1] AL JAROUDI M Y;Hentzell H T G;Gong S .The influence of titanium nitride reactive magnetron sputtering on hardened tool steel surfaces[J].THIN SOLID FILMS,1991,195(1-2):63-76.
[2] Stoiber M.;Badisch E.;Lugmair C.;Mitterer C. .Low-friction TiN coatings deposited by PACVD[J].Surface & Coatings Technology,2003(0):451-456.
[3] Kobayashi M;Doi Y .Reactive high rate D C sputtering: deposition rate, stoichiometry and features of TiOx and TiN, film with respect to the target mode[J].Thin Solid Films,1984,111(03):259.
[4] Rickerby D S;Jones A M;Bellamy B A .Abrasive wear studies of nitrogen implanted aluminium and titanium[J].Surface and Coatings Technology,1989,37(01):31-36.
[5] Veprek S .Plasma-induced and plasma-assisted chemical vapor deposition[J].THIN SOLID FILMS,1985,130(1-2):135-154.
[6] Anders A .Approaches to rid cathodic arc plasma of macro- and nanoparticles:a review[J].Surface and Coatings Technology,1999,120-121(01):319-330.
[7] Boxman R L;Zhitomirsky V;Alterkop B et al.Recent progress in filtered vacuum are deposition[J].Surface and Coatings Technology,1996,86(01):243-253.
[8] Karpov D A .[J].Surface and Coatings Technology,1997,96(01):22-23.
[9] Schuelke T;Witke T;Scheibe H J et al.[J].Surface and Coatings Technology,1999,120(01):226-232.
[10] 李成名;张勇;曹尔妍 等.磁过滤对多弧镀(TiAl)N薄膜的影响[J].中国有色金属学报,2001,11(zk):179-182.
[11] L. J. Yu;X. Wang;X. H. Wang;X. H. Liu .Haemocompatibility of tetrahedral amorphous carbon films[J].Surface & Coatings Technology,2000(0):484-488.
[12] Andre Anders;Robert A. MacGill .Twist filter for the removal of macroparticles from cathodic arc plasmas[J].Surface & Coatings Technology,2000(0):96-100.
[13] P.H. Mayrhofer;F. Kunc;J. Musil .A comparative study on reactive and non-reactive unbalanced magnetron sputter deposition of TiN coatings[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2002(1/2):151-159.
[14] Fritsche B;Chevolleau T;Kourtev J et al.Plasma diagnostic of an RF magnetron Ar/N2 discharge[J].Vacuum,2003,69(1-3):139-145.
[15] Mckenzie D R;Yin Y;Mcfall W D et al.The orientation dependence of elastic strain energy in cubic crystals and its application to preferred orientation in titanium nitrides thin films[J].Journal of Physics:Condensed Matter,1996,8(32):5883-5890.
[16] Oh U C;Je J H .Effects of strain energy on the preferred orientation of TiN thin films[J].Journal of Applied Physics,1993,74(03):1692-1696.
[17] PELLEG J;Zevin L Z;Lungo S .Reactive-sputter-deposited TiN films on glass substrates[J].Thin Solid Films,1991,197(1-2):117-128.
[18] 张铭,何家文.用Kroner模型计算取向薄膜的弹性矩阵与 X射线弹性常数[J].中国有色金属学报,2001(02):198-201.
[19] Davis C A .A simple model for the formation of compressive stress in thin films by ion bombardment[J].Thin Solid Films,1993,226(01):30-34.
上一张 下一张
上一张 下一张
计量
  • 下载量()
  • 访问量()
文章评分
  • 您的评分:
  • 1
    0%
  • 2
    0%
  • 3
    0%
  • 4
    0%
  • 5
    0%