采用超声波技术,原位插层聚合法制备了甲基苯基硅树脂/有机蒙脱土(OMMT)纳米复合材料.利用X射线衍射(XRD),透射电镜(TEM)研究了复合材料内部结构以及超声波时间对蒙脱土分散性影响.结果表明,蒙脱土片层间距随着超声波时间延长而增加,当超声波时间短于20 min时,有机蒙脱土片层以有序的插层型存在,形成插层型的聚合物/蒙脱土纳米复合材料(PLSN);超声波时间长于30 min时,有机蒙脱土片层被剥离,无序地分散在硅树脂基体中,形成剥离型的聚合物/蒙脱土纳米复合材料.
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