双离子束溅射法制备铁氮薄膜

功能材料, 2001, 32(5): 464-466.

1.苏州大学物理系,

2.苏州大学物理系,

3.苏州大学物理系,

4.苏州大学物理系,

5.天津理工学院光电信息与电子工程系,

基金项目: 江苏省重点实验室基金(X2100108029808)

Iron nitride films deposited by dual ion beam sputtering

使用双离子束溅射法制得了铁氮薄膜,随着基片温度的变化,薄膜的成分是ε-Fe2～3N、γ-Fe4N或是二相的混合物,薄膜的晶粒尺寸随基片温度的升高而增大.以振动样品磁强计(VSM)测定了薄膜的磁性能.另外,研究了在基片温度为160℃时,改变主源中通入N2/Ar的比例对薄膜成分的影响.

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