本文通过采用丝网印刷法制备了以)α－Al2O3基片为衬底的纳米和微米级TiO2厚膜，气敏性测试表明，纳米TiO2膜的电阻略高于微米TiO2膜，在实验温度范围内，电阻随氧分压的变化率明显高于微米膜，同时还以XRD，SEM对膜材料的结构和形貌进行了表征．
Nano-TiO2 and micro-TiO2 thick films were prepared on a-Al2O3 substrates by silk netlithograph method, the measured film resistance of nano-TiO2 was higher than that of micro-TiO2 in experimental temperature range, nano-TiO2 film demonstrated more change as the O2 partialpressure changed. XRD and SEM were also used to characterize the stucture of the prepared films.
参考文献
| [1] | |
| [2] | Birkefeld L D, Azad A M, Akbar S A. J. Am. Ceram. Soc. 1992, 75: 2964--2968 2 Harris L A. J. Electrochem. Soc., 1980, 127: 2657--2662 3 Micheli A L. Am. Ceram. Soc. Bull., 1984, 63: 694--698 4 Atta A K, Biswas P K, Ganguli D. Materials Letters, 1992, 15: 99--103 5 Song Zhe, Li qiang, Gao Lian. J. Mater. Sci. & |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分：
-
10%
-
20%
-
30%
-
40%
-
50%