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基于直流弧光放电PCVD金刚石薄膜沉积设备的特点,设计开发了基底自动控温系统.将该系统应用于金刚石薄膜的制备中,并采用SEM、Raman光谱等测试方法对所制备的薄膜的形貌、品质进行了表征.结果证明该系统具有较好的稳定性,其应用时所制备的金刚石薄膜的品质明显得到提高,具有广泛的应用前景.

参考文献

[1] May PW. .Diamond thin films: a 21st-century material[J].Philosophical transactions of the Royal Society. Mathematical, physical, and engineering sciences,2000(1766):473-495.
[2] M. Breiter;C. Doppleb;K. -H. Weiss;G. Nutsch .Diamond synthesis with a DC plasma jet: control of the substrate temperature[J].Diamond and Related Materials,2000(3-6):333-336.
[3] Tamor M A;Everson M P .On the Role of Penetration Twins in the Morphological Development of Vapor Grown Diamond Films[J].Journal of Materials Research,1994,9(07):1839-1848.
[4] Snail K A .Substrate Temperature Control Apparatus and Technique for CVD Reactors[P].USA,5318801,1996-6-7.
[5] Harris S J;Weiner A M .Pressure and Temperature Effects on the Kinetics and Quality of Diamond Films[J].Journal of Applied Physics,1994,75:5026-5032.
[6] Bieberich M T;Girshick S L .Control of Substrate Temperature during Diamond Deposition[J].Plasma Chemistry and Plasma Processing,1996,16(01):157S-168S.
[7] Goodwin D G .Scaling Laws for Diamond Chemical-vapor Deposition.Ⅱ Atomic Hydrogen Transport[J].Journal of Applied Physics,1993,74(11):6895-6906.
[8] Berghaus J O .Induction Plasma Deposition of Diamond Thin Films[D].McGill Univereity,Montreal,1996.
[9] Owano T G;Kruger C H .Parametric Study of Atmospheric-pressure Diamond Synthesis with an Inductively Coupled Plasma Torch[J].Plasma Chemistry and Plasma Processing,1993,13(03):433-446.
[10] Girshick S L;Li C;Yu B W et al.Fluid Boundary Layer Effects in Atmospheric-pressure Plasma Diamond Film Deposition[J].Plasma Chemistry and Plasma Processing,1993,13(02):69-187.
[11] Hanssen L M;Snail K A;Carrington W A et al.Diamond and Non-diamond Carbon Synthesis in an Oxygen Acetylene Flame[J].THIN SOLID FILMS,1991,196(02):271-281.
[12] Snail K A;Thorpe T P .Substrate Temperature Control Apparatus and Technique for CVD Reactors[P].USA,5318801,1994-6-7.
[13] Naoyuki T;KazueT .Method of Holding Substrate and Ssubstrate Holding System[P].USA,5792304,1998-8-11.
[14] Mountsier T;Jose S;Wing J .Wafer Cooling Device[P].USA,5810933,1998-9-22.
[15] Masayoshi I .Method of Substrate Temperature Control and Method of Assessing Substrate Temperature Controllability[P].USA,6532796B1,2003-3-18.
[16] Shepard C B;Niguel J L .Method and Apparatus for Depositing a Substance with Temperature Control[P].USA,5551983,1996-9-3.
[17] Patten D O;Sterling J;Simpson M A .Apparatus and method for depositing a substance with temperature control[P].USA,6099652,2000-8-8.
[18] 傅慧芳;刘顺生;颜恩涛;张湘辉 等.一种金刚石镀膜刀具装置[P].中国,02278407,2005-1.
[19] 汪灵;张湘辉;龙剑平 .一种用于直流弧光放电PCVD金刚石薄膜制备的水冷基底托架装置[P].中国,200820140648,2008-9.
[20] 汪灵;张湘辉;龙剑平 .一种直流弧光放电PCVD金刚石薄膜制备的基底恒温技术[P].中国,200810046252.2,2008-9.
[21] 傅慧芳,张湘辉,颜恩涛,刘顺生.低压气相金刚石中杂质氢的红外光谱研究[J].科学通报,1999(09):998.
[22] 张湘辉,汪灵,龙剑平,常嗣和,周九根.直流弧光放电等离子体CVD金刚石薄膜中的晶体类型与特征[J].矿物岩石,2005(03):100-104.
[23] 张湘辉,汪灵,龙剑平,常嗣和.氩气对直流弧光放电PCVD金刚石薄膜晶体特征的影响[J].人工晶体学报,2010(01):130-134.
[24] Sailsa S R;Gardinera D J et al.Monitoring theQualit y of Diamond Films using Raman Spectra Excited at 514.5 nm and 633 nm[J].Diamond and Related Materials,1996,5(6-8):589-591.
[25] 吴国熙.调节阀使用与维修[M].北京:化学工业出版社,1999
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