用电子回旋共振(ECR)等离子体辅助射频溅射沉积法制备快锂离子传导的锂磷氧氮(LiPON)薄膜. X射线光电子能谱、扫描电子显微镜、紫外可见吸收光谱等手段表征了在不同ECR功率辅助下沉积的薄膜. 结果显示, ECR等离子体对磁控溅射沉积薄膜的生长有明显的影响,能够提高N的插入量, 改变薄膜的组成与结构. 但是过高的ECR功率反而易破坏薄膜的结构, 不利于N的插入. 最佳的实验条件是在ECR 200W辅助下沉积的LiPON薄膜, 它的电导率约为8×10-6S/cm. 讨论了ECR对沉积LiPON薄膜的N插入机理.
Lithium Phosphorus Oxynitride (LiPON) thin films were successfully deposited by r.f. sputtering of Li3PO4 target coupled with electron cyclotron resonance (ECR) in
N2 ambient. The effects of ECR powers on the composition, surface morphology, and structures of the as-deposited thin films were examined by
X-ray photoelectron spectra (XPS), scanning electron microscope (SEM), and UV-Vis spectra measurements. The results indicated that ECR power
had an influence on the growth of LiPON thin films. The optimization condition was found to be at ECR power of 200W to assist r.f. sputtering
deposition of LiPON thin films, and Li ionic conductivity was obtained to be 8.0×10-6S/cm. Too high ECR power may be proven to destroy the
structure of the thin film, and go against the effective insertion of N into Li3PO4. The mechanism of N inserted into Li3PO4 was discussed
during r.f. sputtering process with ECR plasma assisting for the fabrication of LiPON film.
参考文献
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