测试了用水热技术制备的硅纳米孔柱阵列(silicon nanoporous pillar array(简称Si-NPA))的场致发射性能.测试结果显示,Si-NPA的开启电场为约1.48V/μm;在5V/μm的外加电场下,其发射电流密度为28.6μA/cm~2;在外加电场4.4V/μm时,其电流浮动率为13%.Si-NPA发射性能增强的原因是由于其独特的表面形貌和结构所致.
Field emission from silicon nanoporous pillar array (Si-NPA) is studied. The results show that the Si-NPA turn-on field is about 1.48V/μm, the emission current density of 28.6μA/cm~2 is obtained to be 5V/μm, and the current fluctuation ratio is 13% at 4.4V/μm. The enhanced field emission from Si-NPA is attributed to unique surface morphology and structure of Si-NPA.
参考文献
[1] | Jensen K L;Lan Y Y;McGregor D .[J].Applied Physics Letters,2000,77:585-587. |
[2] | Hidenori M;Kentaro M;Kuniyoshi Y .[J].Journal of Vacuum Science and Technology,2003,B21:1612-1615. |
[3] | Utsumi T. .Vacuum microelectronics: what's new and exciting[J].IEEE Transactions on Electron Devices,1991(10):2276-2283. |
[4] | Huang QA.;Poon MC.;Sin JKO. .An interpretation of SiO2-induced emission instability in silicon field emitter[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,1998(1/2):36-40. |
[5] | Temple D;Palmer D;Mancusi J.[A].Asheville,1998:99. |
[6] | Lee KY;Honda S;Katayama M;Kuzuoka T;Baek YG;Ohkura S;Aoki K;Hirao T;Oura K .Synthesis of conical Si array on Si(100) for a field electron emitter by plasma-enhanced chemical vapor deposition[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2004(0):194-198. |
[7] | Takayuki T;Kouji I;SungG R .[J].Japanese Journal of Applied Physics,2000,39:L56-L58. |
[8] | Chen L;El-Gomati M M .[J].Ultramicroscopy,1999,79:135-140. |
[9] | Han BW.;Lee HS.;Ahn BT. .Field emission characteristics of CoSi2/TiN-coated silicon emitter tips[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2002(1/2):45-50. |
[10] | Li JJ;Zheng WT;Gu CZ;Jin ZS .Electron field emission from silicon tip arrays coated by magnetron sputtering carbon nitride film[J].Solid State Communications,2004(3/4):253-257. |
[11] | Minh P N;Tuyen L T T;Ono T .[J].Journal of Vacuum Science and Technology,2003,B21(04):1705-1709. |
[12] | Seeger K;Palmer R E .[J].Applied Physics Letters,1999,74:1627-1629. |
[13] | Jung M Y;Kim D W;Choi S S .[J].Microelectronic Engineering,2000,53:399-402. |
[14] | Wong Y M;Kang W P;Davidson J L .[J].Journal of Vacuum Science and Technology,2003,B21(01):391-394. |
[15] | FU Xiaonan;CHAI Huadou;LI Xinjian .Silicon nanoporous pillar array and its surface copper deposition[J].Chinese science bulletin,2005(14):1424-1428. |
[16] | Fowler R H;Nordhein L W.Electron Emission in Intense Electric Fields[M].London:Proc R Soc,1928 |
[17] | Yu K;Zhang Y S;Luo L Q et al.[J].Physica,2004,B348:391-396. |
[18] | Baranauskas V;Fontana M;Guo Z J .[J].Journal of Applied Physics,2005,97:014912.1-014912.4. |
[19] | Sotgiua G;Schirone L .[J].Applied Surface Science,2005,240:424-431. |
[20] | Lu M;Li M K;Zhang Z J et al.[J].Applied Surface Science,2003,218:196-202. |
[21] | Bisi O;Ossicini S;Pavesi L .[J].Surface Science Reports,2000,38:1-126. |
[22] | She JC.;Xu NS.;Huq SE.;Deng SZ.;Chen J. .Silicon tip arrays with ultrathin amorphous diamond apexes[J].Applied physics letters,2002(22):4257-4259. |
[23] | Li X J;Zhu D L;Chen Q W .[J].Applied Physics Letters,1999,74(03):389-391. |
[24] | Chen QW.;Zhang Y.;Li X. .Improvement mechanism of photoluminescence in iron-passivated porous silicon[J].Chemical Physics Letters,2001(5-6):507-512. |
[25] | 王成伟 .纳米有序阵列复合结构的制备及其场致电子发射特性研究[D].兰州大学,2001. |
[26] | Günther B;Kaldasch F;Müller G .[J].Journal of Vacuum Science and Technology,2003,B21(01):427-432. |
[27] | Huang QA. .INSTABILITY OF FIELD EMISSION FROM SILICON COVERED WITH A THIN OXIDE DUE TO ELECTRON TRAPPING[J].Journal of Applied Physics,1996(7):3703-3707. |
[28] | Bintz W J;McGruer N E .[J].Journal of Vacuum Science and Technology B,1994,B12:697-699. |
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