研究了多弧离子镀Ｔｉ－Ｎ扩散障碍膜的表面形貌、组织结构及高温热稳定性．发现Ｔｉ－Ｎ膜表面存在大量颗粒物；颗粒物对Ｔｉ－Ｎ膜外磁控溅射涂覆的ＭＣｒＡＩＸ包覆型涂层的组织形态及性能有较大影响．Ｘ射线分析表明：Ｔｉ－Ｎ镀膜由δ－ＴｉＮ、ε－ＴｉＤＮ、α－Ｔｉ等多相组成；δ－ＴｉＮ呈明显｛１１１｝择优取向，但经扩散退火处理后，择优取向消失．１０００℃热时效试验结果表明Ｔｉ－Ｎ膜的高温热稳定性良好，与基体及相邻ＭＣｒＡＩＸ镀层间不发生显著互扩散，因而可作为扩散障碍层用于抑止或减缓合金元素在ＧＨ２２０基体及ＭＣｒＡｌＸ涂层间的互扩散．
The surface morphology, structure and high temperature stability of multi-arc plated Ti-N film as a diffusion barrier on nickel-based alloy GH220 have been studied. A lot of palticales which are found on surface of the Ti-N film have great influence on the structure and properties of the magnetic-controlled sputtered MCrAIX coating overlaying the Ti-N film. X-ray diffraction analysis indicates that the Ti-N film consists of δ-TiN, ε-Ti2N, α-Ti, etc. The δ-TiN in the Ti-N film has a strongly preferred {111} orientation, but the preference disappears after the film is diffusion-annealed. Experimental results of aging at 1000℃ demonstrate that the Ti-N film is of good high temperature stability, and the elemental Ti in Ti-N film does not inter-diffuse towards either GH220 alloy or MCrAIX coating. Thus it could be concluded that Ti-N film can be used as a diffusion barrier to prevent the alloying elements from inter-diffusion or slow down the rate of inter-diffusion of alloying elements between the substrate and MCrAIX coating.
参考文献
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