采用电子能量损失谱（EELS）和俄歇电子能谱(AES)研究了铀表面磁控溅射离子镀Ti/Al复合镀层中Ti膜在6.5×10-6PaO2、150℃～400℃和0.05 MPaO2、200℃～500℃环境中表面化学结构变化，并与块状金属Ti的行为进行了比较.结果表明，Ti膜表面结构随着氧化温度和氧分压而变化.在0.05?MPaO2足氧气氛中，在200℃～500℃下氧化时，Ti膜与块状金属Ti表面形成的氧化物均为TiO2.在6.5×10-6PaO2环境中，在较高温度（400℃）下由于表面缺氧Ti膜表面仅形成TiO，在较低温度下（≤250℃）由于O的扩散速度降低，Ti膜逐步向TiO、Ti2O3、TiO2转变，最后在表面形成了TiO2.O在Ti膜中的扩散速度较块状金属Ti明显加快.结合热力学对Ti膜氧化物结构变化进行了讨论.
The chemical structure of Ti film of the dual coating Ti/Al on uranium prepared by magnet-sputtering ion plating technique were studied by electron energy loss spectrum (EELS) and auger electron spectrum (AES) in 6.5×10-6Pa and 0.05 MPa O2 in the range of 150℃～500℃.The oxides formed during the oxidation of both the Ti film and bulk metal Ti depend on temperature and oxygen pressure.In 0.05 MPa O2,TiO2 was formed in the range of 200℃ to 500℃ due to an adequate single oxygen on the Ti coating and the bulk metal Ti surface.In 6.5×10-6Pa O2 atmosphere,Ti of film and bulk metal grad ually turn into TiO,Ti2O3 and TiO2 with an adequate single oxygen at 150℃ and 250℃,however beyond 400℃,only TiO was formed on Ti film with an inadequate single oxygen resulted from O diffusive rate increase.Moreover,compared with the bulk metal Ti,O diffusion rate in the Ti film became fast due to the increase of grain boundary concentration.The experimental results are discussed thermody namically.
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