利用直流磁控溅射法在硅基底上沉积出纳米晶钛薄膜,研究了背底真空度、溅射功率和基底温度对纳米晶钛薄膜结构的影响.实验证明,当背底真空度高于8.8×10-5 Pa时,可制备出致密的纳米晶钛薄膜,当背底真空度低于2.0×10-4 Pa时,钛薄膜被氧化成一氧化钛薄膜；随着溅射功率的增大,纳米晶钛膜的晶粒尺寸呈线性增大,同时钛薄膜的取向也发生改变,表现出明显的(002)织构；随着温度的升高,钛薄膜织构取向发生改变,当温度为500℃时,钛薄膜被氧化为一氧化钛薄膜.制成平整钛薄膜的工艺条件为:背底真空度8.8×10-5 Pa,溅射功率200W,基底温度室温.
参考文献
| [1] | 田民波.薄膜技术与薄膜材料[M].北京:清华大学出版社,2006:22. |
| [2] | 邱成军,曹茂盛,朱静,杨慧静.纳米薄膜材料的研究进展[J].材料科学与工程,2001(04):132-137. |
| [3] | 赵越,刘实,汪伟,郝万立,王隆保,李依依.纳米晶钛薄膜的制备及结构分析[J].原子能科学技术,2002(04):380-383,424. |
| [4] | A study of titanium thin films in transmission laser micro-joining of titanium-coated glass to polyimide[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2010(10):2632. |
| [5] | Braisaz T;Ruterana P;Nouet G et al.Nanocrystalline thin titanium films grown on potassium bromide singlecrystals[J].Thin Solid Films,1998,319(01):140. |
| [6] | Jeyachandran YL;Karunagaran B;Narayandass SK;Mangalaraj D;Jenkins TE;Martin PJ .Properties of titanium thin films deposited by dc magnetron sputtering[J].Materials Science & Engineering, A. Structural Materials: Properties, Misrostructure and Processing,2006(1-2):277-284. |
| [7] | Cai Kaiyong;Michael Muller;Jorg Bossert et al.Surface structure and composition of flat titanium thin filmsas a function of film thickness and evaporation rate[J].Applied Surface Science,2005,250(1-4):252. |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分：
-
10%
-
20%
-
30%
-
40%
-
50%