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本文利用GULP计算软件拟合了CdMoO4晶体势参数,在此基础上研究了该晶体的本征点缺陷,计算了本征点缺陷的生成能.结果表明,在CdMoO4晶体生长过程中,孤立缺陷主要以肖特基缺陷的形式(Vo2+和Vcd2-)存在.晶体中氧的夫伦克儿缺陷具有较低的生成能,是CdMoO4晶体的主要缺陷类型.Cd的夫伦克儿缺陷在高温条件下将起重要作用,由氧空位引起的F心和F+心与700 nm吸收带的形成有关.

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