采用磁控溅射法制备了SiC/ZnO/Si镶嵌结构复合薄膜,对样品采用了不同的温度进行退火处理,测定了样品的光致发光图谱.结果显示,复合薄膜的光致发光强度较单体薄膜有一定的增强,主要原因是发光复合中心的多元化和分布浓度的增加;随着退火温度的不同,各峰位的变化趋势有所不同.
参考文献
[1] | SUN Guo-sheng;LUO Mu-chang;Wang Lei et al.[J].Chinese Journal of Luminescence,2003,24(04):4212425. |
[2] | Jeong S H;Kim B S;Lee B T et al.[J].Applied Physics Letters,2003,82:2625. |
[3] | Dimaria D J;Kirtley J R;Pakulis E J et al.[J].Applied Physics,1984,56:401. |
[4] | Zhao Yong-qing;Zhou Lian;Alain Vassel .[J].Rare Metal Materials and Engineering,2003,32(03):161. |
[5] | Zhu Yan;Yang Yanqing;Ma Zhijun .[J].Rare Metal Materials and Engineering,2002,31(06):410. |
[6] | Kazunori M;Yasushi K;Yukinobu K et al.[J].Japanese Journal of Applied Physics,1997,36(11A):1453-1455. |
[7] | 余明斌,马剑平,罗家骏,陈治明.在硅衬底上用HFCVD法生长的纳米SiC薄膜及其室温光致发光[J].半导体学报,2000(07):673-676. |
[8] | Liu Xueqin;Zhang Jing;Yun Zhijun et al.[J].Mater Phys Mech,2001,4:85. |
[9] | Bachari E M;BauD G;Amor S B et al.[J].Thin Solid Films,1999,348:165-172. |
[10] | Zhang Hong-tao;Xu Zhong-yang;Zou Xue-cheng et al.[J].Ceramic Engineering,2000,24(01):326. |
[11] | Lin Bixia;Fu Zhuxi;Jia Yunbo et al.[J].Acta Physica Sinica,2001,50(11):2208. |
[12] | Yu Wei;He Jie;Sun Yun-tao et al.[J].Photoluminescence of Nano-SiC Annealed by Pulse Laser,2005,25(04):506-508. |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分:
-
10%
-
20%
-
30%
-
40%
-
50%