介质阻挡放电(DBD)是一种可以在常压下工作的放电形式,以这种放电形式为离子源的介质阻挡化学气相沉积(DBD-CVD)技术可以以较高的反应物流量实现多种薄膜的沉积,因而有广阔的应用前景.综述了DBD技术的发展历史及相关理论,着重介绍了DBD-CVD技术及其应用现状,并提出展望.
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