Ge-SiO2薄膜的结构和光学特性研究

材料导报, 2004, 18(z1): 52-53.

Ge-SiO2薄膜的结构和光学特性研究

栾彩霞 ^1, , 侯东华 ^2, , 柴跃生 ^3, , 张敏刚 ^4,

1.太原重型机械学院,太原,030024

2.太原重型机械学院,太原,030024

3.太原重型机械学院,太原,030024;上海大学,上海,200072

4.太原重型机械学院,太原,030024;中科院固体物理研究所,合肥,230031

关键词： Ge纳米晶 , 拉曼散射 , 光致发光 , 透射电子显微镜

Study on Structure and Optical Properties of Ge-SiO2 Films

用射频共溅射技术和后退火的方法,制备出埋入SiO2基质中的Ge纳米晶复合膜(nc-Ge/SiO2).通过拉曼散射、光致发光和透射电子显微镜等手段研究了该复合膜的光学特性和薄膜结构.

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