通过溶胶凝胶甩膜工艺,在抛光的硅晶片(100)基底上制备出Ni0.5Zn0.5Fe2O4(NZF)薄膜并对其结构和磁性的测量结果进行了分析.薄膜表面平整,具有较好的单相结构,其颗粒平均粒径约30nm.制备的NZF薄膜厚度分别约90、120和180nm.实验结果表明,薄膜在低温下表现出自旋玻璃态行为.当外加磁场为7.96×103A/m时,NZF薄膜自旋冻结温度大约在Tf=140K,自旋冻结程度随薄膜厚度增加而降低.在40～300K之间,薄膜饱和磁化强度和矫顽力都随着温度增加而降低.NZF薄膜在T=40K处存在最大磁化强度.较薄薄膜在40K以下饱和磁化强度的降低是因为磁性颗粒表面自旋被部分冻结而导致的磁性离子相互间自旋耦合作用减弱的结果.
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