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为了进一步提高金属的硬度和强度,采用电铸工艺通过添加剂TN2提高阴极过电位,抑制晶粒生长,制备了超细晶镍钴合金层,研究了电流密度和添加剂TN2对铸层晶粒大小的影响.结果表明:提高电流密度可以细化晶粒,当电流密度从5 A/dm~2 增加到15 A/dm~2 时,晶粒大小从5μm 细化到500 nm;添加0.15 g/L TN2 时,铸层表面半光亮,晶粒进一步细化(小于500 nm),硬度高达60 HRC.

Ni-Co alloy coating was prepared by using electroforming technology. The effects of current density and additive TN2 on the grain size of the alloy coating were studied by means of scanning electron microscopy and X-ray diffraction. Results show that increasing current density leads to refined grains. As the current density increased from 5 A/dm~2 to 15 A/dm~2, the grain size decreased from 5μm to 500 nm. The alloy coating obtained in the presence of 0. 15 g/L additive TN2 had zero stress and semi-bright surface. And its gain size was smaller than 500 nm, while its hardness was as high as 60 HRC.

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