The first nucleated phase in compositionally modulated Nb/Si multilayers was identified using transmission electron microscopy (TEM) and X-ray diffraction (XRD). A cubic Nb3Si phase was found to be formed when the Nb/Si multilayers were deposited at 200 degrees C and 300 degrees C. The formation of the crystalline silicide at such low temperatures is explained on the basis of theories of the effective heat of formation and classical nucleation.
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