采用脉冲激光沉积法,控制靶基距分别为4,6,8 cm,在聚乙烯对苯二甲酸酯基底上沉积铟锌氧化物、铟锡氧化物和铝掺杂氧化锌薄膜,研究了靶基距对薄膜电学、光学、形态和结构特性的影响.结果表明:采用6～8 cm靶基距制备的TCO薄膜,在可见光范围内的光学透光率超过90％,电阻率约为5×10-4 Ω·cm;除了这些优良的电学和光学特性外,靶基距8 cm制备的薄膜均匀、光滑、附着好,且无裂缝或任何其它扩展的缺陷,适用于光电设备.
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