利用分子束外延技术,在GaAs(001)基片上外延InGaAs/GaAs异质薄膜,通过RHEED图像演变实时监控薄膜生长状况,采用RHEED强度振荡测量薄膜生长速率,确定薄膜中In/Ga的组分比,并提出控制InGaAs薄膜中In/Ga组分比的生长方法.根据RHEED图像,指出获得的InGaAs薄膜处于(2×3)表面重构相.样品经过淬火至室温后对样品做STM扫描分析,证实样品为表面原子级平整的InGaAs/GaAs异质薄膜.
参考文献
[1] | Kan S;Mokari T;Rothenberg E et al.[J].Nature Materials,2003,1:155. |
[2] | Wang Z M;Feng S L;Lu Z D et al.[J].Journal of Electronic Materials,1996,27:59. |
[3] | 周勋;杨再荣;罗子江.[J].物理学报 |
[4] | Darmo J.;Kordos P.;Forster A.;Dubecky F. .Annealing effect on concentration of EL6-like deep-level state in low-temperature-grown molecular beam epitaxial GaAs[J].Applied physics letters,1998(5):590-592. |
[5] | Neave J H;Dobson P J;Joyce B A .[J].Applied Physics Letters,1985,47:100. |
[6] | LaBella V P;Emery C;Ding Z .[J].Applied Physics Letters,2001,19(79):2001. |
[7] | Gelczuk L;Motyka M;Misiewiez J .[J].Materials Science and Engineering,2008,147:2008. |
[8] | Lee Y;Ahn E .[J].Applied Physics Letters,2007,90:033105. |
[9] | Riposau A;Mirecki Millunchick J .[J].Applied Physics Letters,2006,83:4518. |
[10] | Liu Feng;Tersoff J .[J].Physical Review Letters,1998,80:1268. |
[11] | Chokshi N.;Bouville M.;Millunchick JM. .Pit formation during the morphological evolution of InGaAs/GaAs[J].Journal of Crystal Growth,2002(4):563-571. |
[12] | Shitara T;Zhang J;Neave J H .[J].Journal of Applied Physics,1992,71:4299. |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分:
-
10%
-
20%
-
30%
-
40%
-
50%