采用电解液微弧碳氮化技术(PECN), 在纯钛试样表面沉积出较厚且与基体结合牢固的多孔纳米 Ti(CxN1-x)改性层, 研究了改性层结构和组成随PECN处理时间的演变规律. 结果表明: 随放电处理时间延 长, PECN--Ti(CxN1-x)膜层厚度、膜层中C/N的原子比以及微孔直径皆增加. 处理150 min时, Ti(CxN1-x) 膜层厚度可达15 um, 且膜层是由晶粒尺寸为40-60 nm的纳米晶粒组成. 处理过程中有氢渗入, 并在Ti(CxN1-x) 层下面形成富含TiH2的过渡层. 后期的真空退火处理可以将氢除去使TiH2完全分解, 而不影响表面Ti(CxN1-x) 膜的成分和形貌
ABSTRACT Porous nanocrystalline Ti(CxN1-x) thick films which firmly bond to the substrate were obtained on commercially pure titanium by plasma electrolytic carbonitriding. The evolutions of the microstructure and phase compositions of the PECN modified layers with the treatment time were investigated. The results show that the thickness, ratios of C/N and pores sizes of the Ti(CxN1-x) films tend to increase with the discharge time. When discharge-treated for 150 minutes, the film is about 15 冚m thick and exhibits nanocrystalline characterization with grain size of 40-60 nm. The TiH2-riched layer which was induced by the permeation of hydrogen during the PECN locates beneath the Ti(CxN1-x) film, and it can be completely removed by subsequent vacuum annealing treatment while the composition and the surface morphology of the Ti(CxN1-x) film keep unchanged.
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