采用电弧法分别在高低两种H2分压下制备了Cr纳米粉(标记为CrI和CrII. 在电解液中浸泡过的两种Cr纳米粉的XPS分析结果表明, CrII纳米粉表面在电解液中形成的Cr2O3膜比CrI薄. 电化学分析表明, CrII纳米粉表面更易吸附Cl-, 导致其更容易与Ni共电沉积, 这是因为表面氧化膜较薄的CrII粉, 氧化膜可被表面吸附的Cl-点蚀而穿透, 导电性增强, 使得Ni2+更容易在其表面上还原, 快速将CrII嵌入共电沉积层中.
Two kinds of Cr nanoparticles, CrI and CrII were prepared by an arc plasma process but in a high- and low-H2 partial pressure, respectively. The XPS characterization shows that a thinner Cr-base oxide film was formed on CrII rather than on CrIafter immersion in an electrolyte, which is prepared for the codeposition of the nanoparticles with Ni. Electrochemical impedance spectroscopy (EIS) analysis suggests that in the bath Cl- was easier to be adsorbed by CrII, leading to its facile codeposition with Ni. The reason could be interpreted as follows: CrII was more conductive because the thinner surface oxide film formed was easily pitted through, which caused the nanoparticles to be relatively easier to be engulfed by the Ni electrodeposites on the cathode.
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