采用纯化学处理的方法,在NiTi形状记忆合金表面沉积羟基磷灰石膜层,探讨了在钙化初期引入电脉冲对膜层的影响,分析了钙化液组分浓度以及脉冲参数对膜层生长的响应规律.结果表明:含Ca2+3.10mmol/L,K+ 4.64 mmoL/L,Na+ 126.8 mmol/L,C1-144.5 mmol/L及HPO42-1.86 mmol/L,且呈弱碱性的钙化液最适合钙磷层的生长,采用此钙化液,经适当处理后,试样表面生成了疏松、多孔的钙磷层,经检测,钙磷层为羟基磷灰石和其它钙磷盐的混合物；电脉冲的引入可在一定程度上加速钙磷层的沉积,并提高羟基磷灰石膜的纯度.
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