采用等离子体源离子注入和电子回旋共振--微波等离子体辅助化学气相沉积技术相结合的 方法在Si衬底上制备出了性能良好的类金刚石膜. 通过共聚焦Raman光谱验证了薄膜的类金刚石特性, 用原子力显微镜、 微摩擦计和扫描电镜等对薄膜的表面形貌、摩擦系数和耐磨损性能进行了表征和测量. 结果表明, 用离子注入法制备过渡层大大提高了DLC膜与衬底的结合强度, 薄膜的表面比较光滑, 粗糙度大约为0.198 nm, 具有较低的摩擦系数(0.1$\sim$0.15), 具有较好的耐磨损性能.
Diamond--like carbon (DLC) films were prepared on Si(100) substrates by combining plasma source ion implantation and electron cyclotron resonance microwave plasma enhanced chemical vapor deposition technique. Confocal Raman spectra confirmed the DLC characteristics of the films. The surface roughness of the films was measured with an atomic force microscope. The CERT microtribometer system was employed to obtain information about the scratch resistance, friction properties, and sliding wear resistance of the films. The condition of wear was checked by a scanning electron microscope. The results show that the adherent strength between DLC films and substrates was improved by plasma source ion implantation, and the films had low friction coefficient (0.1$\sim$0.15) and good wear--resistant performance.
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