本研究采用非平衡磁控溅射沉积技术在Si(111)单晶硅片和镜面抛光的渗碳淬火SCM415基片上沉积了无氢高纯类金刚石(DLC)薄膜和无氢Ti添加类金刚石(Ti-DLC)薄膜。高纯DLC采用高纯石墨靶溅射沉积，Ti-DLC采用高纯Ti靶和高纯石墨靶同时溅射沉积而成，通过调节Ti靶的溅射功率获得了含Ti量分别为1.9at.% 、2.14at. %、3at.% 、10.5at.% 、14at.%、25at.% 、34at.%的Ti-DLC薄膜。利用拉曼分光光谱仪(Raman)、X射线光电子能谱仪(XPS) 、X射线衍射仪(XRD)及原子力显微镜(AFM)分析研究了Ti-DLC的组织结构及表面形貌。研究发现，利用非平衡磁控溅射得到的Ti-DLC薄膜，仍具有类金刚石薄膜的sp2、sp3结构，但Ti的加入促进了sp3键向sp2键的转变。添加的Ti以TiC微晶的形式存在于非晶态的DLC中。与Ti添加DLC相比无添加高纯DLC具有更加平滑光洁的表面，但是对于本身就具有一定表面粗躁度的基体来说，Ti的添加有利于弥补基体表面的凸凹缺陷，使DLC表面变得更平滑。
Using an unbalanced magnetron sputtering, hydrogen-free titanium-doped diamond-like carbon (Ti-DLC) and hydrogen-free pure diamond-like carbon (DLC) were deposited. Sputtering from titanium target and graphitic targets simultaneously to form Ti-DLC coatings, the sputtering power of titanium target was varied so the titanium concentration in the Ti-DLC coatings could be controlled from 1.9 to 34at.%. The morphology, structure were investigated by Raman、XPS、XRD and AFM. Results show that all the Ti-DLC coatings have a similar Raman spectrum with pure DLC, but dropping titanium will cause a transform from sp3 configuration to sp2 configuration. Results also show that Ti exists in a form of TiC small crystallites in the DLC structure. Compare with Ti-DLC coatings, pure DLC coating was much smoother, but for some rough base surface, titanium dropping was benefit for getting a smoother coating surface.
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