采用溶胶-凝胶法在硅片基底上制备ZrO2薄膜,在150℃～750℃范围内不同温度下进行热处理,研究了热处理对膜层结构和光学性能的影响.X射线反射用于膜层厚度和界面粗糙度分析,结果表明热处理温度由150℃升至750℃,膜层厚度由常温状态下的112.3nm减小到34.0nm,表面和界面粗糙度均小于2nm.以X射线反射法测得的膜层厚度为初始值,对椭圆偏振仪的测量结果进行拟合,得到不同温度的膜层折射率,结果表明热处理温度为550℃时膜层折射率达到最大值.X射线反射作为直接的膜层厚度测试手段,所得结果为准确分析椭偏光谱提供了参考.
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