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由离子氮化与离子镀复合工艺在A_3钢基材上获得(N~++IP)-TiN复合涂层。其涂层与基格界面的显微硬度随着从涂层表面到基材距离的逐渐增加而缓慢降低。经X射线相分析及电子探针元素分析认为。主要是由于IP-TiN膜与基材之间存在着离子氮化层(εFe_3N-Fe_2N相和Fe_4N相)所致。

The composite coating of (N~++IP)-TiN was prepared by ion-plated TiN film onto ion-nitrided case on the low carbon steel substrate. The microhardness measurement along interface between IP-TiN coating and substrate was detected as a moderate decrease in magnitude with increase of distance from the coating surface.This seems due to the occurrence of ion nitride case, ε-Fe_3N-Fe_2N and Fe_4N phases, along the interface.

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