超导Josephson隧道结是实现超导量子比特的基本元件．本文介绍了一种利用电子束曝光技术和电子束斜蒸发技术相结合的方法来制备铝超导Josephson隧道结．这种方法工艺简单，通过一次光刻就可完成；而且可以通过调节下层光刻胶厚度、斜蒸发角度、悬空桥区宽度等参数可以有效地控制隧道结的面积大小；此外，本方法通过采用不对称电极结构有效地改善了隧道结的漏电流特性，满足了制备超导量子比特的要求．
Superconducting Josephson tunnel junction is the basic component of superconducting qubits. This paper describes a technique using electron beam lithography and electron beam oblique evaporation technology combined to fabricate aluminum superconducting Josephson tunnel junctions. This method is simple can be completed through one photolithography. And the size tunnel junctions can be effectively controlled by adjusting the thickness of lower photoresist, oblique evaporation angle and the width of floating bridge. In addition, the tunnel junction leakage current performance is effectively improved by the use of asymmetric electrode structure and meet the requirements of superconducting qubit quite well.
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