利用IBAD技术在核材料模拟基体(A3钢)上制备ZrN和ZrC薄膜,为作对比又用射频溅射法制备Teflon薄膜.对不同条件下获得的镀膜试样进行耐腐蚀性能测试.结果表明:各种膜层的耐腐蚀性能都较好;对同种材料其膜层的耐腐蚀性能随厚度的增加而增强;ZrC膜层的耐腐蚀性能远好于ZrN和Teflon膜层.
The thin films of ZrN and ZrC have been synthesized on A3 steel by IBAD, and Teflon film has also been made by R.F. sputting. The corrosion resistance of the different deposited films was evaluated by the measurement of the electrochemical polarization in
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