磁控溅射Ni_(56)Mn_(27)Ga_(17)高温形状记忆薄膜的马氏体相变与组织结构

功能材料, 2009, 40(11): 1812-1814.

磁控溅射Ni_(56)Mn_(27)Ga_(17)高温形状记忆薄膜的马氏体相变与组织结构

刘超 ^1, , 牟海维 ^2, , 高新成 ^3, , 夏法锋 ^4, , 高智勇 ^5, , 蔡伟 ^6,

1.大庆石油学院,电子科学学院,黑龙江,大庆,163318

2.大庆石油学院,电子科学学院,黑龙江,大庆,163318

3.大庆石油学院,现代教育技术中心,黑龙江,大庆,163318

4.大庆石油学院,机械科学与工程学院,黑龙江,大庆,163318

5.哈尔滨工业大学,材料科学与工程学院,黑龙江,哈尔滨,150001

6.哈尔滨工业大学,材料科学与工程学院,黑龙江,哈尔滨,150001

基金项目: 国家自然科学基金(50601009)

关键词： Ni-Mn-Ga , 形状记忆合金 , 薄膜 , 磁控溅射

Martensitic transformation and microstructure of the magnetron-sputtered Ni56Mn27Ga17 high temperature shape memory alloy thin film

LIU Chao ^1, , MU Hai-wei ^2, , GAO Xin-cheng ^3, , XIA Fa-feng ^4, , GAO Zhi-yong ^5, , CAI Wei ^6,

1.大庆石油学院,电子科学学院,黑龙江,大庆,163318

2.大庆石油学院,电子科学学院,黑龙江,大庆,163318

3.大庆石油学院,现代教育技术中心,黑龙江,大庆,163318

4.大庆石油学院,机械科学与工程学院,黑龙江,大庆,163318

5.哈尔滨工业大学,材料科学与工程学院,黑龙江,哈尔滨,150001

6.哈尔滨工业大学,材料科学与工程学院,黑龙江,哈尔滨,150001

Keywords： Ni-Mn-Ga , shape memory alloys , thin film , magnetron sputtering

采用磁控溅射方法制备了Ni_(56)Mn_(27)Ga_(17)高温形状记忆合金薄膜,研究了薄膜的马氏体相变行为和组织结构.试验结果表明,Ni_(56)Mn_(27)Ga_(17)薄膜马氏体相变开始温度高达584K,该薄膜室温下为非调制四方结构马氏体.透射电镜观察进一步表明,其马氏体亚结构为(111)I型孪晶.

The Ni_(56 )Mn_(27) Ga_(17) high temperature shape memory alloy thin film has been prepared by using magnetron sputtering method. The martensitic transformation and microstructure of the thin film have been systematically investigated in this work. The results show that the martensitic transformation start temperature is approximate 584K, and it is also found that the martensite of the thin film is nonmodulated tetragonal structure at room temperature. TEM observations and selected-areas electron diffraction analysis reveal that the substructure of martensite variants in Ni_(56 )Mn_(27) Ga_(17) thin film is (111) I twin relationship.

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