采用直流对靶磁控溅射氧化钒薄膜再附加热氧化处理的方式进行金属-半导体相变特性氧化钒薄膜的制备,研究了低热处理温度下热处理温度与时间对氧化钒薄膜组分、晶体结构和相变性能的影响.新制备的氧化钒薄膜为V2O3和VO的混合相.经300℃/1h热处理后,薄膜内出现单斜结构VO2,薄膜具有相变特性;保持热处理时间不变,升高热处理温度至360℃,薄膜表面变得致密,致密的薄膜表面阻碍了氧气与薄膜内部V2O3和VO的反应,VO2成分含量与300℃/1h处理时的含量接近;增加热处理温度并延长热处理时间,如热处理条件为320℃/3h时,薄膜内VO2成分大量增多,电阻值变化幅度超过两个数量级;在300～360℃的热处理温度区间内,薄膜内V2O3和VO不断向VO2转变,相变性能变好,但对VO2的单斜金红石结构没有影响.
参考文献
| [1] | Morin F J .[J].Physical Review Letters,1959,3:34-36. |
| [2] | Lysenko S;Rua AJ;Vikhnin V;Jimenez J;Fernandez F;Liu H .Light-induced ultrafast phase transitions in VO2 thin film[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2006(15):5512-5515. |
| [3] | Manning T D;Parkin I P;Martyn E .[J].Journal of Materials Chemistry,2004,16(04):744-749. |
| [4] | Lee J S;Ortolani M;Schade U et al.[J].Applied Physics Letters,2007,91:133509. |
| [5] | 李金华,袁宁一,谢太斌,但迪迪.超高温度系数V0.97W0.03O2多晶薄膜的制备研究[J].物理学报,2007(03):1790-1795. |
| [6] | Case F C .[J].Journal of Vacuum Science and Technology A:Vacuum Surfaces and Films,1987,5(04):1762-1766. |
| [7] | Kim D H;Kwok H S .[J].Applied Physics Letters,1994,65(25):3188-3190. |
| [8] | Troy D M;Ivan P P;Robin J H C .[J].Journal of Materials Chemistry,2002,12:2936-2939. |
| [9] | 袁宁一,李金华,林成鲁.溶胶-凝胶VO2薄膜转换特性研究[J].物理学报,2002(04):852-856. |
| [10] | 王银玲,李美成,赵连城.磁控溅射氧化钒薄膜的相成分及电阻-温度特性[J].稀有金属材料与工程,2005(07):1077-1080. |
| [11] | Nihei, Y;Sasakawa, Y;Okimura, K .Advantages of inductively coupled plasma-assisted sputtering for preparation of stoichiometric VO2 films with metal-insulator transition[J].Thin Solid Films,2008(11):3572-3576. |
| [12] | Sub J Y;Lopez R;Feldman L C et al.[J].Journal of Applied Physics,2004,96(03):1209-1213. |
| [13] | Wang YL;Li MC;Zhao LC .The effects of vacuum annealing on the structure of VO2 thin films[J].Surface & Coatings Technology,2007(15):6772-6776. |
| [14] | 潘梦霄,曹兴忠,李养贤,王宝义,薛德胜,马创新,周春兰,魏龙.氧化钒薄膜微观结构的研究[J].物理学报,2004(06):1956-1960. |
| [15] | Lv Yuqiang;Hu Ming;Wu Miao et al.[J].Surface and Coatings Technology,2007,201(9-11):4969-4972. |
| [16] | Alov N;Kutsko D;Spirovova I;Bastl Z .XPS study of vanadium surface oxidation by oxygen ion bombardment[J].Surface Science: A Journal Devoted to the Physics and Chemistry of Interfaces,2006(8):1628-1631. |
| [17] | Brassard D;Fourmaux S;Jean-Jacques M et al.[J].Applied Physics Letters,2005,87:051910. |
| [18] | Jiang L;Carr WN .Design, fabrication and testing of a micromachined thermo-optical light modulator based on a vanadium dioxide array[J].Journal of Micromechanics and Microengineering,2004(7):833-840. |
| [19] | 袁宁一,李金华,林成鲁.氧化钒薄膜的结构、性能及制备技术的相关性[J].功能材料,2001(06):572-575. |
| [20] | Xiong Bifeng;Yi Xinjian;Li Yi.[J].IEEE,2000:363-364. |
| [21] | 王利霞,李建平,何秀丽,高晓光.二氧化钒薄膜的低温制备及其性能研究[J].物理学报,2006(06):2846-2851. |
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