使用自行研制的椭球谐振腔式MPCVD装置,以H2-CH4为气源,在输入功率为9 kW,沉积压力为1.7 ×104 Pa和不同的气体流量条件下制备了金刚石膜.利用扫描电镜、激光拉曼谱对金刚石膜的表面和断口形貌、金刚石膜的品质等进行了表征.实验结果表明,利用椭球谐振腔式MPCVD装置能够在较高的功率下进行大面积金刚石膜的沉积；在高功率条件下,较高质量的金刚石膜的沉积速率可以达到4 ～5 μm·h-1的水平,而气体的流量则会显著影响金刚石膜的品质及其沉积速率.
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