欢迎登录材料期刊网

材料期刊网

高级检索

采用固源分子束外延(SSMBE)技术,在α-Al2O3(0001)衬底上直接制备出了SiC薄膜.利用反射式高能电子衍射(RHEED)、Raman光谱、X射线扫描、傅里叶变换红外光谱(FT-IR)、X射线衍射(XRD)等实验技术,对生长的样品的结构和结晶质量进行了表征.结果表明:在蓝宝石衬底上生长出了结晶性能良好的6H-SiC薄膜,且薄膜中存在较小的压应力,这种压应力是由薄膜与衬底之间热膨胀系数的差异所致.

参考文献

[1] Choyke W J;Devaty R P .Progress in the Study of Optical and Related Properties of SiC Since 1992[J].Diamond and Related Materials,1997,6:1243-1248.
[2] Casady J B;Johnson R W .Status of Silicon Carbide (SiC) as a Wide-band Gap Semiconductor for High-temperature Applications[J].Solid-State Electronics,1996,39:1409-1422.
[3] 王崇鲁.白宝石单晶[M].天津:天津科学技术出版社,1983:16-18.
[4] 周阳,仇满德,付跃举,邢金柱,霍骥川,彭英才,刘保亭.蓝宝石衬底上磁控溅射法室温制备外延ZnO薄膜[J].人工晶体学报,2009(01):74-78.
[5] Cheng L;Steckl A J;Scofield J D .SiC Thin-film as a.Fabry-PéRot Interferometer for Fiber-optic Temperature Sensor[J].Journal of Microelectromechanical Systems,2003,12:797-803.
[6] 王剑屏,郝跃,彭军,朱作云,张永华.蓝宝石衬底上异质外延生长碳化硅薄膜的研究[J].物理学报,2002(08):1793-1797.
[7] 孙澜,陈平,韩平,郑有炓,史君,朱嘉,朱顺明,顾书林,张荣.蓝宝石衬底上6H-SiC单晶薄膜的化学气相淀积生长[J].功能材料,2004(02):192-194.
[8] M.C. Luo;J.M. Li;Q.M. Wang;G.Sh. Sun;L. Wang;G.R. Li;Y.P. Zeng;L.Y. Lin .Epitaxial growth and characterization of SiC on C-plane sapphire substrates by ammonia nitridation[J].Journal of Crystal Growth,2003(1/2):1-8.
[9] Fissel A. .Artificially layered heteropolytypic structures based on SiC polytypes: molecular beam epitaxy, characterization and properties [Review][J].Physics Reports: A Review Section of Physics Letters (Section C),2003(3-4):149-255.
[10] Zekentes Z;Papaioannou V;Pecz B et al.Early Stages of Growth of Beta-SiC on Si by MBE[J].Journal of Crystal Growth,1995,157:392-399.
[11] 王科范,刘金锋,邹崇文,徐彭寿,潘海滨,张西庚,王文君.一种新型Si电子束蒸发器的研制及其应用研究[J].真空科学与技术学报,2005(01):75-78.
[12] 刘忠良,任鹏,刘金锋,徐彭寿.硅碳比对Si(111)表面SSMBE异质外延SiC薄膜的影响[J].无机材料学报,2008(03):549-552.
[13] Saddow S E;Mynbaeva M;Smith M C D et al.Growth of SiC Epitaxial Layers on Porous Surfaces of Varying Porosity[J].Applied Surface Science,2001,184:72-76.
[14] Brizard C;Rolland G;Laugier F .Twinning Study of CdTe Epitaxic Layer by X-ray Scan Measurement[J].Journal of Applied Crystallography,1993,26:570-573.
[15] Bagnall DM.;Zhu Z.;Yao T.;Shen MY.;Goto T.;Chen YF. .High temperature excitonic stimulated emission from ZnO epitaxial layers[J].Applied physics letters,1998(8):1038-1040.
[16] Hofmann M;Zywietz A .Lattice Dynamics of SiC Polytypes within the Bondcharge Model[J].Physical Review B:Condensed Matter,1994,50:13401-13411.
[17] Zgheib C;Forster C;Weih R;Cimalla V;Kazan M;Masri R;Ambacher O;Pezoldt J .Infrared ellipsometry of SiC/Si heterostructures with Ge modified interfaces[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2004(0):183-186.
[18] 郝跃;彭军;杨银堂.SiC宽带隙半导体技术[M].北京:科学出版社,2000:118.
[19] 卢文壮,左敦稳,王珉,黎向锋,徐锋.基于电沉积过渡层沉积CVD金刚石薄膜的研究[J].人工晶体学报,2004(01):13-17.
[20] 郑海务,苏剑峰,顾玉宗,张杨,傅竹西.C面蓝宝石衬底上6H-SiC薄膜的低压化学气相外延生长与表征[J].材料研究学报,2008(01):37-41.
上一张 下一张
上一张 下一张
计量
  • 下载量()
  • 访问量()
文章评分
  • 您的评分:
  • 1
    0%
  • 2
    0%
  • 3
    0%
  • 4
    0%
  • 5
    0%