印刷电路板(PCB)镀锡铝工序必不可少,但其对环境有污染,受到了各国的限制.以锡基液加表面活性荆对PCB电镀锡,采用SEM、法拉第定律、稳态极化曲线分别研究了甲醛、OP乳化剂对镀锡层形貌、镀液电流效率、锡电沉积阴极极化的影响.结果表明:甲醛和OP乳化剂均能显著细化晶粒和改变镀层形貌,当甲醛含量太低时,镀层颗粒呈鹅卵石状,随着其含量的增大,镀层形貌向片状和方块状转变,而OP乳化剂含量过低时,镀层呈条柱状和方块状,随其含量的增大,镀层向片状转变;随甲醛及OP乳化荆含量增大,锡电沉积电流效率增大;甲醛使锡沉积阴极峰电流略有增大,过电位增大,OP乳化剂使锡电沉积峰电位显著负移,阴极峰电流显著降低;甲醛和OP乳化剂浓度分别为1.0 mL/L和0.1 mL/L,施镀15 min时,镀层平整、半光亮、结晶细致均匀,镀液分散能力和效率效率分别达到99.39%和97.80%.本研究成果可用于PCB酸性半光亮镀锡.
参考文献
[1] | 金鸿;陈森.印制电路技术[M].北京:化学工业出版社,2003:2-5. |
[2] | 杨宏强.全球PCB产业发展近况[J].印制电路信息,2008(12):9-16. |
[3] | Chen YH;Wang YY;Wan CC .Microstructural characteristics of immersion tin coatings on copper circuitries in circuit boards[J].Surface & Coatings Technology,2007(3):417-424. |
[4] | Wang H Y;Mark P .Effect of low concentrations of Pb2+ on Sn electrodeposition in methyl sulphonic acid solutions[J].Electrochimica Acta,2008,53:2430-2440. |
[5] | 管凌飞,范必威.接插件电镀锡铅故障处理[J].电镀与环保,2006(05):11-12. |
[6] | Nicholas M. Martyak;Robert Seefeldt .Additive-effects during plating in acid tin methanesulfonate electrolytes[J].Electrochimica Acta,2004(25):4303-4311. |
[7] | Greene, JP;Ahmad, I .Molecular plating of actinides on thin backings[J].Nuclear Instruments & Methods in Physics Research. Section A, Accelerators, Spectrometers, Detectors and Associated Equipment,2008(1/3):131-133. |
[8] | Huttunen S E;Tlainen T .Autocatalytic tin plating in the fabrication of tin-ceated copper tube[J].Journal of Materials Processing Technology,2005,170:211-219. |
[9] | 李俊华,费锡明,徐芳.2种有机添加剂对锡电沉积的影响[J].应用化学,2006(09):1042-1046. |
[10] | KYUNG-SEOB KIM;WAN-OK HAN;SUNG-WON HAN .Whisker Growth on Surface Treatment in the Pure Tin Plating[J].Journal of Electronic Materials,2005(12):1579-1585. |
[11] | Keith Whitlaw;Andre Egli;Mike Toben .Preventing whiskers in electrodeposited tin for semiconductor lead frame applications[J].Circuit world,2004(2):20-24. |
[12] | M.Garcia-Gabaldon;V.Perez-Herranz;J.Garcia-Anton .Electrochemical recovery of tin from the activating solutions of the electroless plating of polymers Galvanostatic operation[J].Separation and Purification Technology,2006(2):143-149. |
[13] | 张立茗;方景礼;袁国伟.实用电镀添加剂[M].北京:化学工业出版社,2007:470-474. |
[14] | 张景双;石金声;石磊.电镀溶液与镀层性能测试[M].北京:化学工业出版社,2003:115-116. |
[15] | 方景礼.电镀添加剂理论与应用[M].北京:国防工业出版社,2007:224-255. |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分:
-
10%
-
20%
-
30%
-
40%
-
50%