用反应磁控溅射法在不同的氮分压下沉积了Nb-Si-N薄膜.结果表明:Nb-Si-N膜的成分、结构和性能随氮分压的改变而不同.随氮分压的增加,Nb-Si-N膜的Nb/Si比和表面粗糙度减小;薄膜的电阻值和微硬度增加.Nb-Si-N膜的结构为纳米晶NbN与类似Si3N4非晶相组成的纳米复合结构,且随着氮分压的增加,Nb-Si-N膜的非晶倾向增强,晶粒尺寸减小.
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