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采用双向脉冲电镀工艺镀钨,并对工艺参数影响镀钨层织构进行研究.首次采用(222)不完整极图对钼片基体上的钨镀层织构进行研究.结果表明:钨镀层具有为{001}<110>织构;工艺条件的变化对镀层织构的影响主要体现在织构的散漫程度随着脉冲周期和迭加直流分量的增加而增加.金相和SEM观察均表明镀层为微观不平整表面,并借助表面的数据对钨镀层的形貌进行解释.

Adoping the two-directional pulse plating process,and by means of incomplete(222)pole figures,the textures of tungsten coating on cold-rolled molybdenum substrate were studied thoroughly.It was found that the textures of tungsten coating are{001}<110>.Effects of operating parameters on the distribution of textures were investigated.As the periodic and direct currents added on to the pulsing current were increased,the desultoriness became larger.Metallography and SEM observations indicate that the coating has a micro corse surface,which is attributed to the free surface energy.

参考文献

[1] 杨绮琴.中国电化学研究工作系统介绍--熔盐电沉积稀土金属及其合金的研究[J].电化学,1997(02):117.
[2] 马瑞新,李国勋.熔盐镀钨的历史与发展趋势[J].材料保护,1999(02):4-6.
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