采用电子束蒸发法在光阳极导电玻璃基底上制备了一层致密的TiO2薄膜,并在氧氛围下进行不同温度的退火处理。以此TiO2薄膜为阻挡层来阻止电解质溶液中I3-与导电玻璃基底上光生电子的复合。分别利用X射线衍射（XRD）和X射线光电子能谱（XPS）对此薄膜的结构和成分进行表征。制备不同厚度的TiO2阻挡层薄膜并研究其对电池光电性能的影响。实验结果表明,阻挡层的引入有效地抑制了暗反应的发生,提高了染料敏化太阳能电池（DSSC）的开路电压、短路电流和光电转换效率,比未引入阻挡层的DSSC的光电转换效率提高了31.5%。
Dense TiO2 films were prepared on conducting glass substrates by electron beam evaporation,and annealed in O2 atmosphere at different temperatures.In order to prevent the charge recombination at the interface of conducting glass substrate/electrolyte（I-3）,the film was used as a blocking layer in dye-sensitized solar cell.The structure and composition were characterized by XRD and XPS,respectively.The influence of different thickness blocking layers on the photovoltaic properties of DSSC was investigated.The results reveal that the introduction of blocking layer effectively prevents the charge-transfer reaction and enhances the open voltage,short current,FF and photoelectric conversion efficiency.The photoelectric conversion efficiency is higher than that of without blocking layer by 31.5%.
参考文献
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