对晶向为（100）的p型单晶硅片进行表面刻蚀,制作减反射绒面。本实验是在传统氢氧化钠-异丙醇混合液中分别加入不同浓度的醋酸钠溶液、硅酸钠溶液和碳酸钠溶液对单晶硅片进行刻蚀。实验发现：分别加入醋酸钠溶液、碳酸钠溶液并没有在降低表面反射率方面起到很大作用,而只有加入硅酸钠溶液降低了表面反射率,有利于形成较好的腐蚀绒面。因此,在传统氢氧化钠-异丙醇混合液中添加一定浓度硅酸钠溶液能够制备出平均反射率较低的减反射绒面。
The surfaces of p-type silicon（100） wafers were texturized to reduce the surface reflectance for solar cells.We investigated different texturing processes by adding low concentration CH3COONa,Na2SiO3,Na2CO3 solutions into conventional solution of NaOH ＋ IPA（isopropyl alcohol）,respectively.We found that by adding CH3COONa and Na2CO3 solutions into mixed NaOH ＋ IPA solution,respectively,the average reflectivity of the textured surfaces does not decrease,but by adding Na2SiO3 solution,the average reflectivity of the textured surfaces reduces and achieves a pyramid-shaped surface morphology.Therefore,a better surface texturing method was found by adding a low concentration of Na2SiO3 solution into the conventional mixed NaOH ＋ IPA solution to obtain a low surface reflectivity for Si solar cells.
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