本文用射频磁控溅射技术,以金属铟为靶材,在石英玻璃上制备出了InN薄膜,溅射气体为氩气(Ar)和氮气(Nz)的混合气体,溅射压强为0.5Pa～1.0Pa.InN晶体呈六方纤锌矿结构,随着压强的不同,晶体取向发生明显的变化,制得的InN薄膜的带隙为2.1eV ～2.3eV.X射线光电子能谱(XPS)和拉曼(Raman)分析氧原子以类似In2O3的形式存在,其存在会引起InN晶体质量变差,致使InN的带隙明显升高.
参考文献
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