本文合成了N-(p-羧基苯基)甲基丙烯酰胺单体,并将其与N-苯基马来酰亚胺共聚得到共聚物聚N-(p-羧基苯基)甲基丙烯酰胺共N-苯基马来酰亚胺(poly(NCMA-co-NPMI)).将此共聚物作为成膜树脂,与感光剂、溶剂等复配得到一种新型耐高温紫外正型光刻胶.本文探讨了该光刻胶的最佳配方组成和最佳光刻工艺.最佳配方组成为:15%-20%成膜树脂,4.5%-6% 感光剂和70%-80%溶剂;最佳光刻工艺为:匀胶30 s(4000 rpm),前烘4 min(90 ℃),感度为30-35 mJ/cm~2,在0.2%TMAH溶液显影10 s和后烘2 min(90 ℃).
The poly(N-(p-carboxylphenyl)methacrylamide-co-N-phenylmaleimide) was copolymerized with monomer N-(p-carboxylphenyl)methacrylamide (NCMA) and N-phenylmaleimide (NPMI). To apply this copolymer as the matrix resin with photosensitizer and solvents to fomulate a novel thermostable UV positive photoresist. The photoresist formulation and the photolithographic process were studied and optimized. Its optimal formulation was 15%-20% matrix resin, 4 5%-6% photo-sensitizer, and 70%-80% solvent, and its photolithographic process was spin-coating 30 s (4000 rpm), pre-baking 4 min at 90 ℃,exposuring 3 min, developing in 0.2% TMAH aqueous solution for 10 s and then post-baking 2 min at 90 ℃.
参考文献
| [1] | 姜军,周芳,曾俊英,杨铁锋.光刻技术的现状和发展[J].红外技术,2002(06):8-13,36. |
| [2] | LIU Jian-guo,LI Ping,LI Ping,ZHENG Jia-shen.一种新的紫外光刻胶成膜树脂的制备及其性能[C].第八届中国辐射固化年会论文汇编,2007:195-199. |
| [3] | Will Conley .Considerations in the development of deep UV photoresist material & processes[J].Proceedings of SPIE,1995,2438:40-52. |
| [4] | Richard S T;Robert A A;Aonrad G H et al.High-T_g base-soluble copolymers as novolac replacements for positive photoresists[J].Polymer Engineering and Science,1986,26(16):1096-1100. |
| [5] | Chiang W Y;Lu J Y .Preparation and properties of Si-containing copolymer for near-UV resist.I Poly (N-(4-hydrophenyl) maleimide-alt-p-trimethylsilylstyrene)[J].Journal of Polymer Science Part A,1991,29:399-410. |
| [6] | 彭进,张琳琪,邹文俊,左光汉.N-（4-羟基苯基）马来酰亚胺的合成研究[J].河南化工,2003(07):13-16. |
| [7] | 袁明荣,黄建兵,龚本民.聚苯乙烯-N-（4-羟基苯基）-马来酰亚胺合成的研究[J].高分子材料科学与工程,1990(01):84-88. |
| [8] | Tawney P O;Synder R H;Bryan C E .The chemistry of maleimide and its derivatives.Ⅰ N-carbamylmaleimide[J].Organic Chemistry,1960,25(01):56-60. |
| [9] | Tawney P O;Synder R H;Conger R P .The chemistry of maleimide and its derivatives.Ⅱ Maleimide and N-methylolmaleimide[J].Organic Chemistry,1961,26(01):15-21. |
| [10] | Ludwig Bauer;Stanley V Miarka .Stereospecific lossen rearrangements[J].Organic Chemistry,1959,24(12):1293-1296. |
| [11] | 刘建国,李平,李萍,郑家燊.甲基丙烯酰氯制备方法的改进[J].化学试剂,2007(11):699-700. |
| [12] | 金正能,路建美,徐庆锋,王丽华.邻,间,对甲基丙烯酰胺基苯甲酸的合成、表征及荧光性能的研究[J].光谱学与光谱分析,2006(09):1644-1648. |
| [13] | 王慧,游凤祥,陈明.高玻璃化温度化学增幅光致抗蚀剂的制备[J].感光科学与光化学,1998(03):245. |
| [14] | 袁明荣;黄建兵;龚本民 .一种新型耐热性抗干法蚀刻正性光刻胶的研制[J].感光材料,1989,3:28-30. |
- 下载量()
- 访问量()
- 您的评分：
-
10%
-
20%
-
30%
-
40%
-
50%