通过电化学测量技术研究了丙烯基硫脲对低磷化学镀镍过程的影响，结果表明， 丙烯基硫脲在低浓度时，通过电子转移机理加速了Ｎｉ＾２＋的还原过程，表现出明显的加速作用； 在高浓度时，由于电极表面较厚吸附层的存在，阻碍Ｈ２ＰＯ２＾－在催化表面的氧化反应，表现为 对沉积反应换抑制作用。
Electrochemical measurements have been carried out to investigate the influ- ence of allylthiourea on the deposition process of electroless nickel with low content of phos- phorus. The results indicated that allylthiourea increased the deposition rate through the mechanism of electron transfer when its concentration was lower (<5mg/L), which acceler- ated the reduction of Nizf. And the deposition process was inhibited due to the existence of thicker adsorption layer on deposition surface when its concentration was higher (>5mg/L), which inhibited the oxidation of HzPO;.
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