以立方焦绿石Bi1.5Zn1.0Nb1.5O7(BZN)为配方基础,通过掺入过量10%的Bi2O3,形成Bi1.65Zn1.0Nb1.5O7.225非化学计量比分子式.采用固相反应法合成具有焦绿石立方结构的Bi1.65Zn1.0Nb1.5O7.225陶瓷,并采用脉冲激光沉积法在Pt/SiO2/Si(100)基片上制备其薄膜.对比研究了非化学计量比Bi1.5Zn1.0Nb1.5O7.225陶瓷和薄膜的结晶性能,微观形貌以及介电性能的差异.结果表明烧结的Bi1.65Zn1.0Nb1.5O7.225陶瓷和沉积的BZN薄膜都保持立方焦绿石单相结构,但是薄膜展现出较强的(222)晶面择优取向.陶瓷和薄膜的晶格常数,微观形貌都体现出差异.对比二者的介电特性后发现,Bi1.65Zn1.0Nb1.5O7.225薄膜的介电常数明显高于陶瓷的介电常数,这归因于薄膜和块体材料之间的差异,例如厚度,致密度,择优取向等.
参考文献
[1] | Du HL.;Yao X. .Synthesis and dielectric properties development of new thermal stable bismuth pyrochlores[J].The journal of physics and chemistry of solids,2002(11):2123-2128. |
[2] | Kamba S .Anonalous broad didectric relaxation in Bi1.5Zn1.0Nb1.5O7 Pyrochlore[J].Physical Review B,2002,66:054106-054109. |
[3] | Levina I;Amos T G;Nino J C et al.Crystal Structure of the Compound Bi2Zn2/3 Nb4/3 O7[J].Journal of Materials Research,2002,17:1406-1411. |
[4] | Lu J W;Susanne Stemmer Low-loss .Tunable Bismuth Zinc Niobate Films Deposited by RF Magnetron Sputtering[J].Applied Physics Letters,2003,83:2411-2413. |
[5] | Medium permittivity bismuth zinc niobate thin film capacitors[J].Journal of Applied Physics,2003(3):1941-1947. |
[6] | Sudheendran, K;Krishna, MG;Raju, CJ .Effect of process parameters and post-deposition annealing on the microwave dielectric and optical properties of pulsed laser deposited Bi1.5Zn1.0Nb1.5O7 thin films[J].Applied physics, A. Materials science & processing,2009(2):485-492. |
[7] | 赵学国,罗民华.Sr1+xSm1-xAl1-xTixO4微波陶瓷介电性能研究[J].人工晶体学报,2011(05):1348-1352. |
[8] | 廖润华,李月明,王进松,李润润,刘虎,杜洁.两步熔盐法制备片状NaNbO3晶体[J].人工晶体学报,2010(05):1216-1220. |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分:
-
10%
-
20%
-
30%
-
40%
-
50%