利用横截面电镜样品,对Ni基体磁控溅射离子镀Al膜进行了透射电镜观察。研究了不同工艺条件下镀膜的组织形态,相结构以及相分布。镀覆5min时,在Ni基体和镀Al膜交界处,发现一个Al-Ni系中迄今未见报道的未知相。经电子衍射分析其为体心四方点阵,a=b=0.588nm,c=0.480nm。研究了随时间变化的镀膜组织结构变化情况。
A new phase is found at the interface between Al film and Ni substrate when thetime of ion-plating has come to 5 min. And it is identified to be body centered tetragonal latticewith the constants a=b=0.588 nm, c=0.480 nm. The varieties of the microstractures and phases withthe ion-plating time are observed. Based on these results, the ion-plating film formation mechanismis also discussed.
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