综述了Ⅲ-V族稀磁半导体(Ga,Mn) As磁电性质的研究进展,尤其是(Ga,Mn)As单层膜和多层膜结构的磁电输运性质的详细研究状况.关于(Ga,Mn) As的结构与物理性质的信息可由单层膜的反常霍尔效应、平面霍尔效应、电阻对温度的依赖关系与磁阻各向异性等磁电输运性质测量得到;而多层膜中观察到的自旋阀效应、自旋相关散射与层间交互耦合等现象,对加深稀磁半导体的基本物性认识、拓展稀磁半导体的实际应用空间非常重要.最后总结并展望了(Ga,Mn) As未来的发展趋势.
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